The influence of process parameters and annealing temperature on the physical properties of sputtered NiO thin films

I. Hotovy, J. Huran, S. Hascik, J. Liday, Helmut Sitter, L. Spiess

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@article{3d5fd8a5b7f441a08b19cafb30f1afae,

title = "The influence of process parameters and annealing temperature on the physical properties of sputtered NiO thin films",

author = "I. Hotovy and J. Huran and S. Hascik and J. Liday and Helmut Sitter and L. Spiess",

year = "2003",

language = "English",

volume = "69",

pages = "237--242",

journal = "Vacuum",

publisher = "Elsevier",

}