Abstract
Mg–Zn thin film alloys were produced by thermal co-evaporation using single source and
dual source geometries. The films containing high amount of Zn (66 at.%) were prone to formation of metallic micro spheres on the surface
when high evaporation rates (10nms-1) were used. TheMg–27.1 at.% Zn bulk alloy was found to be suitable for co-deposition with Al for
producing Al–Mg–Zn thin film alloys. A low Al concentration gradient (5 at.%) could be obtained along the sample due to the high deposition
rates of Mg–Zn (7.5 nms-1) combined with low Al deposition rates (0.2nms-1). TheAl–Mg–Zn thin films showed an improved resistance against
chemical attack when higher amounts of Al are used, as shown by downstream analytics investigations using a flat flow electrochemical cell
coupled to an AAS system.
| Original language | English |
|---|---|
| Pages (from-to) | 1000-1005 |
| Number of pages | 6 |
| Journal | Physica Status Solidi A: Applications and Materials Science |
| Volume | 210 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 2013 |
Fields of science
- 204001 Inorganic chemical technology
JKU Focus areas
- Engineering and Natural Sciences (in general)