Optical properties of individual site-controlled Ge quantum dots

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Abstract

We report photoluminescence (PL) experiments on individual SiGe quantum dots (QDs) that were epitaxially grown in a site-controlled fashion on pre-patterned Si(001) substrates. We demonstrate that the PL line-widths of single QDs decrease with excitation power to about 16 meV, a value that is much narrower than any of the previously reported PL signals in the SiGe/Si heterosystem. At low temperatures, the PL-intensity becomes limited by a 25 meV high potential-barrier between the QDs and the surrounding Ge wetting layer (WL). This barrier impedes QD filling from the WL which collects and traps most of the optically excited holes in this type-II heterosystem.
Original languageEnglish
Article number251904
Pages (from-to)251904
Number of pages5
JournalApplied Physics Letters
Volume106
Issue number25
DOIs
Publication statusPublished - 22 Jun 2015

Fields of science

  • 103 Physics, Astronomy

JKU Focus areas

  • Nano-, Bio- and Polymer-Systems: From Structure to Function

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