Abstract
We report photoluminescence (PL) experiments on individual SiGe quantum dots (QDs) that were epitaxially grown in a site-controlled fashion on pre-patterned Si(001) substrates. We demonstrate that the PL line-widths of single QDs decrease with excitation power to about 16 meV, a value that is much narrower than any of the previously reported PL signals in the SiGe/Si heterosystem. At low temperatures, the PL-intensity becomes limited by a 25 meV high potential-barrier between the QDs and the surrounding Ge wetting layer (WL). This barrier impedes QD filling from the WL which collects and traps most of the optically excited holes in this type-II heterosystem.
| Original language | English |
|---|---|
| Article number | 251904 |
| Pages (from-to) | 251904 |
| Number of pages | 5 |
| Journal | Applied Physics Letters |
| Volume | 106 |
| Issue number | 25 |
| DOIs | |
| Publication status | Published - 22 Jun 2015 |
Fields of science
- 103 Physics, Astronomy
JKU Focus areas
- Nano-, Bio- and Polymer-Systems: From Structure to Function