On the Mechanism of Ion Transport in Thin (1-100 nm) Oxide films on Aluminum and Tantalum

Achim Walter Hassel (Editor), M. M. Lohrengel (Editor), S. Rüße, J. W. Schultze

Research output: Contribution to journalArticlepeer-review

Abstract

The growth of anodic oxide films on Al and Ta is determined by the electric field strength. A simultaneous migration of anions (e.g. 0^2-) and cations (e.g. Al^3+) is necessary to prevent the formation of uncompensated space charges, which would lower the local field strength and would hinder further oxide growth. The formation of mobile ions is possible only at the interfaces and their migration through requires some time, which depends on the local field strength. Therefore, the movement of space charges and the local field strength are coupled by Poisson's law. Result is a delayed oxide formation or overshoot, well-known from potentiostatic and potential sweep experiments. Fundamentally, the film grows at both interfaces.
Original languageEnglish
Pages (from-to)49-54
Number of pages6
JournalBulletin of the Chemists and Technologists of Macedonia
Volume13
Publication statusPublished - 1994

Fields of science

  • 104005 Electrochemistry
  • 104006 Solid state chemistry
  • 104014 Surface chemistry
  • 104017 Physical chemistry
  • 105113 Crystallography
  • 105116 Mineralogy
  • 503013 Subject didactics of natural sciences
  • 204 Chemical Process Engineering
  • 204001 Inorganic chemical technology
  • 205016 Materials testing
  • 210006 Nanotechnology
  • 211104 Metallurgy

JKU Focus areas

  • Engineering and Natural Sciences (in general)

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