Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: II. Continuous Irradiation

Peter Mogyorosi; Klaus Piglmayer; R. Kullmer; Dieter Bäuerle

doi:10.1007/BF00617934

Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: II. Continuous Irradiation

Peter Mogyorosi
, Klaus Piglmayer
, R. Kullmer
, Dieter Bäuerle

Institute of Applied Physics

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	293-299
Number of pages	7
Journal	Applied Physics A
Volume	45
Issue number	4
DOIs	https://doi.org/10.1007/BF00617934
Publication status	Published - Apr 1988

Fields of science

103016 Laser physics
103020 Surface physics
103 Physics, Astronomy
103008 Experimental physics
103021 Optics
103023 Polymer physics

JKU Focus areas

Engineering and Natural Sciences (in general)

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10.1007/BF00617934

Cite this

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title = "Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: II. Continuous Irradiation",

author = "Peter Mogyorosi and Klaus Piglmayer and R. Kullmer and Dieter B{\"a}uerle",

year = "1988",

month = apr,

doi = "10.1007/BF00617934",

language = "English",

volume = "45",

pages = "293--299",

journal = "Applied Physics A",

issn = "1432-0630",

publisher = "Springer Verlag",

number = "4",

}

TY - JOUR

T1 - Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: II. Continuous Irradiation

AU - Mogyorosi, Peter

AU - Piglmayer, Klaus

AU - Kullmer, R.

AU - Bäuerle, Dieter

PY - 1988/4

Y1 - 1988/4

UR - https://www.scopus.com/pages/publications/0023997823

U2 - 10.1007/BF00617934

DO - 10.1007/BF00617934

M3 - Article

SN - 1432-0630

VL - 45

SP - 293

EP - 299

JO - Applied Physics A

JF - Applied Physics A

IS - 4

ER -

Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: II. Continuous Irradiation

Fields of science

JKU Focus areas

Access to Document

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Cite this