Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: III. Combined cw- and Pulsed-Irradiation

R. Kullmer; Dieter Bäuerle

doi:10.1007/BF00615502

Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: III. Combined cw- and Pulsed-Irradiation

Institute of Applied Physics

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	377-386
Number of pages	10
Journal	Applied Physics A
Volume	47
Issue number	4
DOIs	https://doi.org/10.1007/BF00615502
Publication status	Published - Dec 1988

Fields of science

103016 Laser physics
103020 Surface physics
103 Physics, Astronomy
103008 Experimental physics
103021 Optics
103023 Polymer physics

JKU Focus areas

Engineering and Natural Sciences (in general)

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10.1007/BF00615502

Cite this

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title = "Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: III. Combined cw- and Pulsed-Irradiation",

author = "R. Kullmer and Dieter B{\"a}uerle",

year = "1988",

month = dec,

doi = "10.1007/BF00615502",

language = "English",

volume = "47",

pages = "377--386",

journal = "Applied Physics A",

issn = "1432-0630",

publisher = "Springer Verlag",

number = "4",

}

TY - JOUR

T1 - Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: III. Combined cw- and Pulsed-Irradiation

AU - Kullmer, R.

AU - Bäuerle, Dieter

PY - 1988/12

Y1 - 1988/12

UR - https://www.scopus.com/pages/publications/0024136241

U2 - 10.1007/BF00615502

DO - 10.1007/BF00615502

M3 - Article

SN - 1432-0630

VL - 47

SP - 377

EP - 386

JO - Applied Physics A

JF - Applied Physics A

IS - 4

ER -

Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: III. Combined cw- and Pulsed-Irradiation

Fields of science

JKU Focus areas

Access to Document

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