Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: I. Pulsed-Irradiation

R. Kullmer, Dieter Bäuerle

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)227-232
Number of pages10
JournalApplied Physics A
Volume43
DOIs
Publication statusPublished - 1987

Fields of science

  • 103016 Laser physics
  • 103020 Surface physics
  • 103 Physics, Astronomy
  • 103008 Experimental physics
  • 103021 Optics
  • 103023 Polymer physics

JKU Focus areas

  • Engineering and Natural Sciences (in general)

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