Laser-Assisted Chemical Vapor Deposition of Boron

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	405-411
Number of pages	7
Journal	Journal of the Chinese Chemical Society
Volume	42
Issue number	2
DOIs	https://doi.org/10.1002/jccs.199500054
Publication status	Published - Apr 1995

Fields of science

@article{f92edf38908e4e80acb158bb9c78e527,

title = "Laser-Assisted Chemical Vapor Deposition of Boron",

author = "Mats Boman and Dieter B{\"a}uerle",

year = "1995",

month = apr,

doi = "10.1002/jccs.199500054",

language = "English",

volume = "42",

pages = "405--411",

journal = "Journal of the Chinese Chemical Society",

issn = "0009-4536",

number = "2",

}

TY - JOUR

T1 - Laser-Assisted Chemical Vapor Deposition of Boron

AU - Boman, Mats

AU - Bäuerle, Dieter

PY - 1995/4

Y1 - 1995/4

UR - https://www.scopus.com/pages/publications/84986505864

U2 - 10.1002/jccs.199500054

DO - 10.1002/jccs.199500054

M3 - Article

SN - 0009-4536

VL - 42

SP - 405

EP - 411

JO - Journal of the Chinese Chemical Society

JF - Journal of the Chinese Chemical Society

IS - 2

ER -