Kr+ Laser-Induced Chemical Vapor Deposition of W

Gui qiang Zhang; Tamas Szörényi; Dieter Bäuerle

doi:10.1063/1.339767

Kr+ Laser-Induced Chemical Vapor Deposition of W

Gui qiang Zhang, Tamas Szörényi, Dieter Bäuerle

Institute of Applied Physics

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	673-675
Number of pages	3
Journal	Journal of Applied Physics
Volume	62
Issue number	2
DOIs	https://doi.org/10.1063/1.339767
Publication status	Published - 1987

Fields of science

103016 Laser physics
103020 Surface physics
103 Physics, Astronomy
103008 Experimental physics
103021 Optics
103023 Polymer physics

JKU Focus areas

Engineering and Natural Sciences (in general)

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10.1063/1.339767

Cite this

@article{094974a2cca5406db07468bb47f7c4d0,

title = "Kr+ Laser-Induced Chemical Vapor Deposition of W",

author = "Zhang, \{Gui qiang\} and Tamas Sz{\"o}r{\'e}nyi and Dieter B{\"a}uerle",

year = "1987",

doi = "10.1063/1.339767",

language = "English",

volume = "62",

pages = "673--675",

journal = "Journal of Applied Physics",

issn = "1089-7550",

publisher = "American Institute of Physics",

number = "2",

}

TY - JOUR

T1 - Kr+ Laser-Induced Chemical Vapor Deposition of W

AU - Zhang, Gui qiang

AU - Szörényi, Tamas

AU - Bäuerle, Dieter

PY - 1987

Y1 - 1987

UR - https://www.scopus.com/pages/publications/0006325124

U2 - 10.1063/1.339767

DO - 10.1063/1.339767

M3 - Article

SN - 1089-7550

VL - 62

SP - 673

EP - 675

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 2

ER -

Kr+ Laser-Induced Chemical Vapor Deposition of W

Fields of science

JKU Focus areas

Access to Document

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Cite this