Abstract
Inverse pattern design for profilometric measurement
methods based upon the inversion of a distorted fringe pattern caused
by a reference object is a common technique for both mirrorlike surfaces
and surfaces with diffuse reflection behavior. This paper proposes
the calculation of an inverted pattern for analytically known
reference objects based upon ray tracing techniques. Thus, a manufactured
reference object with an associated reference fringe pattern
is no longer required to fully reconstruct object shapes.
| Original language | English |
|---|---|
| Title of host publication | IEEE INternational Workshop on Imaging 2007 |
| Number of pages | 6 |
| Publication status | Published - 2007 |
Fields of science
- 101014 Numerical mathematics
- 102003 Image processing
- 103021 Optics
- 202 Electrical Engineering, Electronics, Information Engineering
- 202012 Electrical measurement technology
- 202014 Electromagnetism
- 202015 Electronics
- 202016 Electrical engineering
- 202021 Industrial electronics
- 202022 Information technology
- 202024 Laser technology
- 202027 Mechatronics
- 202036 Sensor systems
- 202037 Signal processing
- 202039 Theoretical electrical engineering
- 203016 Measurement engineering
- 211908 Energy research