High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films

Tobias Frischmuth; Michael Schneider; Daniel Maurer; Thomas Grille; Ulrich Schmid

doi:10.1016/j.tsf.2016.05.001

High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films

Tobias Frischmuth, Michael Schneider, Daniel Maurer, Thomas Grille, Ulrich Schmid

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	6-11
Number of pages	6
Journal	Thin Solid Films
Volume	611
DOIs	https://doi.org/10.1016/j.tsf.2016.05.001
Publication status	Published - 2016

Fields of science

101 Mathematics
102 Computer Sciences
202 Electrical Engineering, Electronics, Information Engineering
202009 Electrical drive engineering
202027 Mechatronics
202034 Control engineering
202036 Sensor systems
203 Mechanical Engineering
203033 Hydraulic drive technology

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@article{297d5bc35c704ca3afd41f349eedf9eb,

title = "High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films",

author = "Tobias Frischmuth and Michael Schneider and Daniel Maurer and Thomas Grille and Ulrich Schmid",

year = "2016",

doi = "10.1016/j.tsf.2016.05.001",

language = "English",

volume = "611",

pages = "6--11",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films

AU - Frischmuth, Tobias

AU - Schneider, Michael

AU - Maurer, Daniel

AU - Grille, Thomas

AU - Schmid, Ulrich

PY - 2016

Y1 - 2016

UR - https://www.scopus.com/pages/publications/84970963263

U2 - 10.1016/j.tsf.2016.05.001

DO - 10.1016/j.tsf.2016.05.001

M3 - Article

SN - 0040-6090

VL - 611

SP - 6

EP - 11

JO - Thin Solid Films

JF - Thin Solid Films

ER -

High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films

Fields of science

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