Skip to main navigation Skip to search Skip to main content

Hall mobility of narrow Si0.2Ge0.8-Si quantum wells on Si0.5Ge0.5 relaxed buffer substrates

  • Claudiu V. Falub
  • , Elisabeth Müller
  • , M. Scheinert
  • , L. Diehl
  • , U. Gennser
  • , Thomas Fromherz
  • , S. Tsujino
  • , H. Sigg
  • , Detlev Grützmacher
  • , Y. Campidelli
  • , O. Kermarrec
  • , D. Bensahel
  • , A. Borak

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)2829-2831
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number15
DOIs
Publication statusPublished - 12 Apr 2004

Fields of science

  • 103 Physics, Astronomy
  • 103009 Solid state physics
  • 103011 Semiconductor physics
  • 103017 Magnetism
  • 103018 Materials physics
  • 103040 Photonics
  • 202032 Photovoltaics
  • 210006 Nanotechnology

Cite this