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Fabrication of n- and p- channel in-plane-gate transistors from Si/SiGe/Ge heterostructures by focused laser beam writing

Research output: Contribution to journal › Article › peer-review

Original languageEnglish
Pages (from-to)3025-3027
Number of pages3
JournalApplied Physics Letters
Volume68
Issue number21
DOIs
Publication statusPublished - 1996

Fields of science

  • 103 Physics, Astronomy
  • 103009 Solid state physics
  • 103011 Semiconductor physics
  • 103017 Magnetism
  • 103018 Materials physics
  • 103040 Photonics
  • 202032 Photovoltaics
  • 210006 Nanotechnology

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