Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications

Gerald Stocker; Jasmin Spettel; Thomas Grille; Thomas Ostermann; Reyhaneh Jannesari; Bernhard Jakoby

doi:10.1109/ASMC51741.2021.9435707

Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications

Gerald Stocker, Jasmin Spettel, Thomas Grille, Thomas Ostermann, Reyhaneh Jannesari, Bernhard Jakoby

Institute of Microelectronics and Microsensors

Research output: Chapter in Book/Report/Conference proceeding › Conference proceedings › peer-review

Original language	English
Title of host publication	Proc. 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2021
Pages	1-4
Number of pages	4
ISBN (Electronic)	9781728186450
DOIs	https://doi.org/10.1109/ASMC51741.2021.9435707
Publication status	Published - 2021

Publication series

Name	ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
Volume	2021-May
ISSN (Print)	1078-8743

Fields of science

202019 High frequency engineering
202021 Industrial electronics
202036 Sensor systems
203017 Micromechanics
202 Electrical Engineering, Electronics, Information Engineering
202027 Mechatronics
202028 Microelectronics
202037 Signal processing
502058 Digital transformation

JKU Focus areas

Digital Transformation

Access to Document

10.1109/ASMC51741.2021.9435707

Cite this

Stocker, G., Spettel, J., Grille, T., Ostermann, T., Jannesari, R., & Jakoby, B. (2021). Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications. In Proc. 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2021 (pp. 1-4). Article 9435707 (ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings; Vol. 2021-May). https://doi.org/10.1109/ASMC51741.2021.9435707

Stocker, Gerald ; Spettel, Jasmin ; Grille, Thomas et al. / Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications. Proc. 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2021. 2021. pp. 1-4 (ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings).

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title = "Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications",

author = "Gerald Stocker and Jasmin Spettel and Thomas Grille and Thomas Ostermann and Reyhaneh Jannesari and Bernhard Jakoby",

year = "2021",

doi = "10.1109/ASMC51741.2021.9435707",

language = "English",

series = "ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings",

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Stocker, G, Spettel, J, Grille, T, Ostermann, T, Jannesari, R & Jakoby, B 2021, Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications. in Proc. 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2021., 9435707, ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings, vol. 2021-May, pp. 1-4. https://doi.org/10.1109/ASMC51741.2021.9435707

Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications. / Stocker, Gerald; Spettel, Jasmin; Grille, Thomas et al.
Proc. 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2021. 2021. p. 1-4 9435707 (ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings; Vol. 2021-May).

Research output: Chapter in Book/Report/Conference proceeding › Conference proceedings › peer-review

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T1 - Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications

AU - Stocker, Gerald

AU - Spettel, Jasmin

AU - Grille, Thomas

AU - Ostermann, Thomas

AU - Jannesari, Reyhaneh

AU - Jakoby, Bernhard

PY - 2021

Y1 - 2021

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U2 - 10.1109/ASMC51741.2021.9435707

DO - 10.1109/ASMC51741.2021.9435707

M3 - Conference proceedings

T3 - ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

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EP - 4

BT - Proc. 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2021

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Stocker G, Spettel J, Grille T, Ostermann T, Jannesari R, Jakoby B. Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications. In Proc. 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2021. 2021. p. 1-4. 9435707. (ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings). doi: 10.1109/ASMC51741.2021.9435707

Fabrication of high Aspect-Ratio Si Pillar-based Hybrid plasmonic-photonic Crystal Waveguides for ultra-sensitive Infrared Gas-sensing Applications

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