Excimer-Laser Surface Processing in CH2I2 Atmospheres: Simultaneous Localized Etching of Si and Deposition of C

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	D113-D118
Number of pages	10
Journal	Journal of the Electrochemical Society
Volume	156
Issue number	4
DOIs	https://doi.org/10.1149/1.3071315
Publication status	Published - Jan 2009

Fields of science

@article{079f90a468c04ef9ae7a21fc8b3634ac,

title = "Excimer-Laser Surface Processing in CH2I2 Atmospheres: Simultaneous Localized Etching of Si and Deposition of C",

author = "Abdul Rashid and L. Landstr{\"o}m and Klaus Piglmayer",

year = "2009",

month = jan,

doi = "10.1149/1.3071315",

language = "English",

volume = "156",

pages = "D113--D118",

journal = "Journal of the Electrochemical Society",

issn = "1945-7111",

number = "4",

}

TY - JOUR

T1 - Excimer-Laser Surface Processing in CH2I2 Atmospheres: Simultaneous Localized Etching of Si and Deposition of C

AU - Rashid, Abdul

AU - Landström, L.

AU - Piglmayer, Klaus

PY - 2009/1

Y1 - 2009/1

UR - https://www.scopus.com/pages/publications/61349118674

U2 - 10.1149/1.3071315

DO - 10.1149/1.3071315

M3 - Article

SN - 1945-7111

VL - 156

SP - D113-D118

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

IS - 4

ER -