Excimer-laser ablation and micro-patterning of ceramic Si3N4

Johannes Heitz; Johannes David Pedarnig; Dieter Bäuerle; G. Petzow

doi:10.1007/s003390050575

Excimer-laser ablation and micro-patterning of ceramic Si3N4

Institute of Applied Physics

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	259-261
Number of pages	3
Journal	Applied Physics A
Volume	65
Issue number	3
DOIs	https://doi.org/10.1007/s003390050575
Publication status	Published - 1997

Fields of science

103016 Laser physics
210005 Nanophotonics

JKU Focus areas

Engineering and Natural Sciences (in general)

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10.1007/s003390050575

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@article{4aaaba0fa8054475bb18f5191f334def,

title = "Excimer-laser ablation and micro-patterning of ceramic Si3N4",

author = "Johannes Heitz and Pedarnig, \{Johannes David\} and Dieter B{\"a}uerle and G. Petzow",

year = "1997",

doi = "10.1007/s003390050575",

language = "English",

volume = "65",

pages = "259--261",

journal = "Applied Physics A",

issn = "1432-0630",

publisher = "Springer Verlag",

number = "3",

}

TY - JOUR

T1 - Excimer-laser ablation and micro-patterning of ceramic Si3N4

AU - Heitz, Johannes

AU - Pedarnig, Johannes David

AU - Bäuerle, Dieter

AU - Petzow, G.

PY - 1997

Y1 - 1997

UR - https://www.scopus.com/pages/publications/0031235740

U2 - 10.1007/s003390050575

DO - 10.1007/s003390050575

M3 - Article

SN - 1432-0630

VL - 65

SP - 259

EP - 261

JO - Applied Physics A

JF - Applied Physics A

IS - 3

ER -

Excimer-laser ablation and micro-patterning of ceramic Si3N4

Fields of science

JKU Focus areas

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