Exact Determination of the Real Substrate Temperature and Film Thickness in Vacuum Epitaxial Growth Systems by Visible Laser Interferometry

Helmut Sitter; G.J. Glanner; M.A. Herman

doi:10.1016/0042-207X(94)E0019-U

Exact Determination of the Real Substrate Temperature and Film Thickness in Vacuum Epitaxial Growth Systems by Visible Laser Interferometry

Helmut Sitter, G.J. Glanner, M.A. Herman

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	69-76
Number of pages	8
Journal	Vacuum
Volume	46
Issue number	1
DOIs	https://doi.org/10.1016/0042-207X(94)E0019-U
Publication status	Published - 1995

Fields of science

103 Physics, Astronomy
103009 Solid state physics
103011 Semiconductor physics
103017 Magnetism
103018 Materials physics
210006 Nanotechnology
103040 Photonics
202032 Photovoltaics

Access to Document

10.1016/0042-207X(94)E0019-U

Cite this

@article{579a71e2b83e4ed8a38fd3297adc3e6e,

title = "Exact Determination of the Real Substrate Temperature and Film Thickness in Vacuum Epitaxial Growth Systems by Visible Laser Interferometry",

author = "Helmut Sitter and G.J. Glanner and M.A. Herman",

year = "1995",

doi = "10.1016/0042-207X(94)E0019-U",

language = "English",

volume = "46",

pages = "69--76",

journal = "Vacuum",

publisher = "Elsevier",

number = "1",

}

TY - JOUR

T1 - Exact Determination of the Real Substrate Temperature and Film Thickness in Vacuum Epitaxial Growth Systems by Visible Laser Interferometry

AU - Sitter, Helmut

AU - Glanner, G.J.

AU - Herman, M.A.

PY - 1995

Y1 - 1995

U2 - 10.1016/0042-207X(94)E0019-U

DO - 10.1016/0042-207X(94)E0019-U

M3 - Article

VL - 46

SP - 69

EP - 76

JO - Vacuum

JF - Vacuum

IS - 1

ER -