Abstract
To reach the theoretical performance limit of 4H-SiC MOSFETs the SiC/SiO2-interface de[1]fects along the inversion channel need to be fully identified. We employ a measurement technique that allows to observe energetically resolved trap states at the SiC/SiO2-interface by measuring the electro[1]lumiscence of a gate pulsed MOSFET. The spectra are recorded at room and cryogenic temperatures with a spectrometer and two different amplitudes of the gate pulse. Comparison of the results to lit[1]erature allows for identification of the L1 line of the D1 center with an energy of 2.9 eV and suggests donor-acceptor-pair recombination or Z1/2 to be responsible for the emission around 2.5 eV. Ioniza[1]tion energies of PbC and related vacancy centers determined via ab initio calculations show similar results as the experimental data and provide a possible classification of the trap level around 1.8 eV. © 2023 The Author(s). Published by Trans Tech Publications Ltd, Switzerland.
Original language | English |
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Pages (from-to) | 15 – 23 |
Number of pages | 8 |
Journal | Materials Science Forum |
Volume | 1091 |
DOIs | |
Publication status | Published - 2023 |
Fields of science
- 103 Physics, Astronomy
JKU Focus areas
- Digital Transformation