Diffusion of thiols during microcontact printing with rigid stamps

Iris Bergmair; Michael Mühlberger; Elisabeth Lausecker; Kurt Hingerl; Rainer Schöftner

doi:10.1016/j.mee.2009.12.058

Diffusion of thiols during microcontact printing with rigid stamps

Iris Bergmair
, Michael Mühlberger
, Elisabeth Lausecker
, Kurt Hingerl
, Rainer Schöftner

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	848-850
Number of pages	3
Journal	Microelectronic Engineering
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.12.058
Publication status	Published - May 2010

Fields of science

103026 Quantum optics
103009 Solid state physics
103 Physics, Astronomy
103011 Semiconductor physics
202018 Semiconductor electronics
210006 Nanotechnology

JKU Focus areas

Engineering and Natural Sciences (in general)

Access to Document

10.1016/j.mee.2009.12.058

Cite this

@article{dcfb7cf9b1ff4a45a0a548dc251eadc5,

title = "Diffusion of thiols during microcontact printing with rigid stamps",

author = "Iris Bergmair and Michael M{\"u}hlberger and Elisabeth Lausecker and Kurt Hingerl and Rainer Sch{\"o}ftner",

year = "2010",

month = may,

doi = "10.1016/j.mee.2009.12.058",

language = "English",

volume = "87",

pages = "848--850",

journal = "Microelectronic Engineering",

issn = "1873-5568",

publisher = "ELSEVIER SCIENCE BV",

number = "5-8",

}

TY - JOUR

T1 - Diffusion of thiols during microcontact printing with rigid stamps

AU - Bergmair, Iris

AU - Mühlberger, Michael

AU - Lausecker, Elisabeth

AU - Hingerl, Kurt

AU - Schöftner, Rainer

PY - 2010/5

Y1 - 2010/5

UR - https://www.scopus.com/pages/publications/76949106080

U2 - 10.1016/j.mee.2009.12.058

DO - 10.1016/j.mee.2009.12.058

M3 - Article

SN - 1873-5568

VL - 87

SP - 848

EP - 850

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

Diffusion of thiols during microcontact printing with rigid stamps

Fields of science

JKU Focus areas

Access to Document

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Cite this