CH4/H2 plasma etching of IV-VI semiconductor nanostructurs

Thomas Schwarzl, Wolfgang Johann Heiss, Gudrun Kocher-Oberlehner, Gunther Springholz

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	L11-L14
Journal	Semiconductor Science and Technology
Issue number	14
Publication status	Published - 1999

Fields of science

This output contributes to the following UN Sustainable Development Goals (SDGs)

@article{8c4bb729ad0e497e8d8944958de86325,

title = "CH4/H2 plasma etching of IV-VI semiconductor nanostructurs",

author = "Thomas Schwarzl and Heiss, \{Wolfgang Johann\} and Gudrun Kocher-Oberlehner and Gunther Springholz",

year = "1999",

language = "English",

pages = "L11--L14",

journal = "Semiconductor Science and Technology",

issn = "0268-1242",

publisher = "IOP Publishing",

number = "14",

}