CH4/H2 Plasma Etching of IV-VI Semiconductor Nanostructures

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	L11-L14
Number of pages	4
Journal	Semiconductor Science and Technology
Volume	14
Issue number	2
DOIs	https://doi.org/10.1088/0268-1242/14/2/003
Publication status	Published - Feb 1999

Fields of science

@article{c1cbd3df6b364760bba9578224aec0ed,

title = "CH4/H2 Plasma Etching of IV-VI Semiconductor Nanostructures",

author = "Thomas Schwarzl and Hei{\ss}, \{Wolfgang Johann\} and Gudrun Kocher-Oberlehner and Gunther Springholz",

year = "1999",

month = feb,

doi = "10.1088/0268-1242/14/2/003",

language = "English",

volume = "14",

pages = "L11--L14",

journal = "Semiconductor Science and Technology",

publisher = "IOP Publishing",

number = "2",

}

TY - JOUR

T1 - CH4/H2 Plasma Etching of IV-VI Semiconductor Nanostructures

AU - Schwarzl, Thomas

AU - Heiß, Wolfgang Johann

AU - Kocher-Oberlehner, Gudrun

AU - Springholz, Gunther

PY - 1999/2

Y1 - 1999/2

UR - https://www.scopus.com/pages/publications/0033076373

U2 - 10.1088/0268-1242/14/2/003

DO - 10.1088/0268-1242/14/2/003

M3 - Article

VL - 14

SP - L11-L14

JO - Semiconductor Science and Technology

JF - Semiconductor Science and Technology

IS - 2

ER -