Ar+ Laser Induced Chemical Vapor Deposition of Si from SiH4

Dieter Bäuerle; P. Irsigler; Günter Leyendecker; H. Noll; Dieter wagner

doi:10.1063/1.93272

Ar+ Laser Induced Chemical Vapor Deposition of Si from SiH4

Dieter Bäuerle
, P. Irsigler
, Günter Leyendecker
, H. Noll
, Dieter wagner

Institute of Applied Physics

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	819-821
Number of pages	3
Journal	Applied Physics Letters
Volume	40
Issue number	9
DOIs	https://doi.org/10.1063/1.93272
Publication status	Published - 1982

Fields of science

103016 Laser physics
103020 Surface physics
103 Physics, Astronomy
103008 Experimental physics
103021 Optics
103023 Polymer physics

JKU Focus areas

Engineering and Natural Sciences (in general)

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10.1063/1.93272

Cite this

@article{720693a4266c4f64ad5e44cbbbc7f1ff,

title = "Ar+ Laser Induced Chemical Vapor Deposition of Si from SiH4",

author = "Dieter B{\"a}uerle and P. Irsigler and G{\"u}nter Leyendecker and H. Noll and Dieter wagner",

year = "1982",

doi = "10.1063/1.93272",

language = "English",

volume = "40",

pages = "819--821",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "9",

}

TY - JOUR

T1 - Ar+ Laser Induced Chemical Vapor Deposition of Si from SiH4

AU - Bäuerle, Dieter

AU - Irsigler, P.

AU - Leyendecker, Günter

AU - Noll, H.

AU - wagner, Dieter

PY - 1982

Y1 - 1982

UR - https://www.scopus.com/pages/publications/0040391565

U2 - 10.1063/1.93272

DO - 10.1063/1.93272

M3 - Article

SN - 0003-6951

VL - 40

SP - 819

EP - 821

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 9

ER -

Ar+ Laser Induced Chemical Vapor Deposition of Si from SiH4

Fields of science

JKU Focus areas

Access to Document

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