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Analysis and combination of different approaches for selective and directional thermal emission

Research output: Chapter in Book/Report/Conference proceedingConference proceedingspeer-review

Abstract

There are many concepts providing narrowband and highly directional mid-infrared (mid-IR) thermal emission for integrated senor applications. In this contribution, we simulate the combination of two different concepts, each featuring individual signatures with respect to emission properties. The first concept is composed of an aperiodic multilayer stack of alternating dielectric layers (Si and SiO2) deposited on a planar metallic surface acting as heater ([1,2]). The dielectric double-layers either have quarter-wavelength (QW) thickness forming a Bragg mirror. This is followed by a half-wavelength (HW) cavity-layer of SiO2 on top of a silver surface. The second concept is based on a structured silver surface, which utilizes the excitation of surface plasmon polaritons (SPPs) to gain the desired emission enhancement at the target wavelength ([3]). The very high coherence of the SPPs results in an extremely narrowband and directional emission. However, unwanted emission modes from SPP overtones can be a significant downside of this concept. We simulate and discuss the possibility of a combination of both concepts, which has the potential of keeping selective and high intensity emission properties without unwanted adjacent emission bands.
Original languageEnglish
Title of host publicationProc. AMA Sensor Conference
Pages664 - 669
Number of pages6
DOIs
Publication statusPublished - 2017

Publication series

NameProceedings Sensor 2017

Fields of science

  • 202019 High frequency engineering
  • 202021 Industrial electronics
  • 202036 Sensor systems
  • 203017 Micromechanics
  • 202 Electrical Engineering, Electronics, Information Engineering
  • 202027 Mechatronics
  • 202028 Microelectronics
  • 202037 Signal processing

JKU Focus areas

  • Computation in Informatics and Mathematics
  • Mechatronics and Information Processing

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