Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: I. Pulsed-Irradiation

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@article{91261e4ceb7e419292f99d12320253db,

title = "Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: I. Pulsed-Irradiation",

author = "R. Kullmer and Dieter B{\"a}uerle",

year = "1987",

month = jul,

doi = "10.1007/BF00615982",

language = "English",

volume = "43",

pages = "227--232",

journal = "Applied Physics A",

issn = "1432-0630",

publisher = "Springer Verlag",

number = "3",

}

TY - JOUR

T1 - Laser-Induced Chemical Etching of Silicon in Chlorine Atmosphere: I. Pulsed-Irradiation

AU - Kullmer, R.

AU - Bäuerle, Dieter

PY - 1987/7

Y1 - 1987/7

UR - https://www.scopus.com/pages/publications/0023384557

U2 - 10.1007/BF00615982

DO - 10.1007/BF00615982

M3 - Article

SN - 1432-0630

VL - 43

SP - 227

EP - 232

JO - Applied Physics A

JF - Applied Physics A

IS - 3

ER -