Laser cleaning of silicon wafers: mechanisms and efficiencies

M. Mosbacher; M. Bertsch; H.-J. Münzer; V. Dobler; B.-U. Runge; Dieter Bäuerle; J. Boneberg; Paul Leiderer

doi:10.1117/12.456821

Laser cleaning of silicon wafers: mechanisms and efficiencies

M. Mosbacher
, M. Bertsch
, H.-J. Münzer
, V. Dobler
, B.-U. Runge
, Dieter Bäuerle
, J. Boneberg
, Paul Leiderer

Institut für Angewandte Physik

Publikation: Beitrag in Buch/Bericht/Konferenzband › Konferenzbeitrag › Begutachtung

Originalsprache	Englisch
Titel	Second International Symposium on Laser Precision Microfabrication
Seiten	308-314
Seitenumfang	7
Band	4426
DOIs	https://doi.org/10.1117/12.456821
Publikationsstatus	Veröffentlicht - Mai 2002

Publikationsreihe

Name	Proceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)	0277-786X

Wissenschaftszweige

103016 Laserphysik
210005 Nanophotonik

Zugriff auf Dokument

10.1117/12.456821

Andere Dateien und Links

Verknüpfung zur Publikation in Scopus

Dieses zitieren

Mosbacher, M., Bertsch, M., Münzer, H.-J., Dobler, V., Runge, B.-U., Bäuerle, D., Boneberg, J., & Leiderer, P. (2002). Laser cleaning of silicon wafers: mechanisms and efficiencies. in Second International Symposium on Laser Precision Microfabrication (Band 4426, S. 308-314). (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.456821

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title = "Laser cleaning of silicon wafers: mechanisms and efficiencies",

author = "M. Mosbacher and M. Bertsch and H.-J. M{\"u}nzer and V. Dobler and B.-U. Runge and Dieter B{\"a}uerle and J. Boneberg and Paul Leiderer",

year = "2002",

month = may,

doi = "10.1117/12.456821",

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volume = "4426",

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Mosbacher, M, Bertsch, M, Münzer, H-J, Dobler, V, Runge, B-U, Bäuerle, D, Boneberg, J & Leiderer, P 2002, Laser cleaning of silicon wafers: mechanisms and efficiencies. in Second International Symposium on Laser Precision Microfabrication. Bd. 4426, Proceedings of SPIE - The International Society for Optical Engineering, S. 308-314. https://doi.org/10.1117/12.456821

Laser cleaning of silicon wafers: mechanisms and efficiencies. / Mosbacher, M.; Bertsch, M.; Münzer, H.-J. et al.
Second International Symposium on Laser Precision Microfabrication. Band 4426 2002. S. 308-314 (Proceedings of SPIE - The International Society for Optical Engineering).

Publikation: Beitrag in Buch/Bericht/Konferenzband › Konferenzbeitrag › Begutachtung

TY - GEN

T1 - Laser cleaning of silicon wafers: mechanisms and efficiencies

AU - Mosbacher, M.

AU - Bertsch, M.

AU - Münzer, H.-J.

AU - Dobler, V.

AU - Runge, B.-U.

AU - Bäuerle, Dieter

AU - Boneberg, J.

AU - Leiderer, Paul

PY - 2002/5

Y1 - 2002/5

UR - https://www.scopus.com/pages/publications/0036384569

U2 - 10.1117/12.456821

DO - 10.1117/12.456821

M3 - Conference proceedings

VL - 4426

T3 - Proceedings of SPIE - The International Society for Optical Engineering

SP - 308

EP - 314

BT - Second International Symposium on Laser Precision Microfabrication

ER -