Functional photoresists for sub-diffraction stimulated emission depletion lithography

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@article{fd619af7f5204f499d6f5bbc8bc62d94,

title = "Functional photoresists for sub-diffraction stimulated emission depletion lithography",

author = "Richard Wollhofen and Bianca Buchegger and Christine Eder and Jaroslaw Jacak and Johannes Kreutzer and Thomas Klar",

year = "2017",

doi = "10.1364/OME.7.002538",

language = "English",

volume = "7",

pages = "2538 -- 2559",

journal = "Optical Materials Express",

issn = "2159-3930",

number = "7",

}

TY - JOUR

T1 - Functional photoresists for sub-diffraction stimulated emission depletion lithography

AU - Wollhofen, Richard

AU - Buchegger, Bianca

AU - Eder, Christine

AU - Jacak, Jaroslaw

AU - Kreutzer, Johannes

AU - Klar, Thomas

PY - 2017

Y1 - 2017

UR - https://www.scopus.com/pages/publications/85021640993

U2 - 10.1364/OME.7.002538

DO - 10.1364/OME.7.002538

M3 - Article

SN - 2159-3930

VL - 7

SP - 2538

EP - 2559

JO - Optical Materials Express

JF - Optical Materials Express

IS - 7

ER -