Anisotropic resistivity in pulsed-laser deposited Bi 
            2 Sr 
            2 CaCu 
            2 O 
            8+δ films

Anisotropic resistivity in pulsed-laser deposited Bi ₂ Sr ₂ CaCu ₂ O _8+δ films

Publikation: Beitrag in Fachzeitschrift › Artikel › Begutachtung

@article{b4eb938acba742a6bd7a569943f2c4e2,

title = "Anisotropic resistivity in pulsed-laser deposited Bi 2 Sr 2 CaCu 2 O 8+δ films",

author = "Li, \{S. T.\} and Alfons Ritzer and Siegfried Proyer and Elke Stangl and Dieter B{\"a}uerle and N. Reschauer",

year = "1996",

month = apr,

doi = "10.1016/0169-4332(95)00572-2",

language = "English",

volume = "96-98",

pages = "713--716",

journal = "Applied Surface Science",

issn = "1873-5584",

publisher = "Elsevier",

}

TY - JOUR

T1 - Anisotropic resistivity in pulsed-laser deposited Bi 2 Sr 2 CaCu 2 O 8+δ films

AU - Li, S. T.

AU - Ritzer, Alfons

AU - Proyer, Siegfried

AU - Stangl, Elke

AU - Bäuerle, Dieter

AU - Reschauer, N.

PY - 1996/4

Y1 - 1996/4

UR - https://www.scopus.com/pages/publications/0030562983

U2 - 10.1016/0169-4332(95)00572-2

DO - 10.1016/0169-4332(95)00572-2

M3 - Article

SN - 1873-5584

VL - 96-98

SP - 713

EP - 716

JO - Applied Surface Science

JF - Applied Surface Science

ER -