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Amorphous-like interfacial layer between a high-Tc superconducting Tl-1223 film and a Ag substrate examined by high-voltage high-resolution transmission electron microscopy

  • B. J. Kim (Herausgeber*in)
  • , H. T. Kim
  • , T, Nagai
  • , Y. Matsui
  • , S. Horiuchi
  • , D. Y. Jeong
  • , Christian Deinhofer
  • , Gerhard Gritzner
  • , Y. M. Kim
  • , Y. J. J. Kim

Publikation: Beitrag in FachzeitschriftArtikelBegutachtung

Abstract

The thin amorphous-like layer, formed at the interface between a high-Tc superconducting (Tl0.5Pb0.5)(Sr0.8Ba0.2)Ca2Cu3Oy (Tl-1223) film and a Ag substrate during heating at 910 °C, has been examined by using high-voltage high-resolution transmission electron microscopy. The interfacial layer is less than 10 nm in thickness. It contacts the (001) plane of Tl-1223 and the (113) or (133) planes of Ag in most cases. Its composition is similar to that of Tl-1223, except for the inclusion of a substantial amount of Ag. Its formation proceeds by diffusion of Ag into Tl-1223, during which a structure change first occurs at the layer of CuO2 + Ca planes. The Tl(Pb)O + the Sr(Ba)O layers are then destroyed to cause the total structure to become amorphous-like. Furthermore, we have found that it is formed under an irradiation of highly energetic electrons
OriginalspracheEnglisch
Seiten (von - bis)1155 - 1158
Seitenumfang4
FachzeitschriftJournal of the Korean Physical Society
Volume48
Ausgabenummer5
PublikationsstatusVeröffentlicht - Mai 2006

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  • TNF Allgemein

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